Determination of impurities in silica sol for polishing solution in semiconductor industry—Inductively coupled plasma atomic emission spectrometric method

JC/T 2133-2012 Determination of impurities in silica sol for polishing solution in semiconductor industry—Inductively coupled plasma atomic emission spectrometric method
Standard No.:	JC/T 2133-2012	Status:	VALID remind me the status change Email:
Target Language:	English	File Format:	PDF
Word Count:	4000 words	Translation Price:	120 (USD) remind me the price change Email:
Implemented on:	2013-06-01	Delivery:	via email in 1-3 business day
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Standard No.:	JC/T 2133-2012
Chinese Name:	半导体抛光液用硅溶胶中杂质元素含量的测定 -电感耦合等离子体原子发射光谱法
English Name:	Determination of impurities in silica sol for polishing solution in semiconductor industry—Inductively coupled plasma atomic emission spectrometric method
Professional Classification:	C14
ICS Classification:	71.040
Issued by:
Issued on:	2012-12-28
Implemented on:	2013-06-01
Status:	VALID
Target Language:	English
File Format:	PDF
Word Count:	4000 words
Translation Price:	120 (USD)
Delivery:	via email in 1-3 business day

JC/T 2133-2012 The following standards are cited：

JC/T 2133-2012 Cited by the following standards：