High-purity tungsten and tungsten alloy sputtering target used in electronic film

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YS/T 1025-2015 High-purity tungsten and tungsten alloy sputtering target used in electronic film
Standard No.:	YS/T 1025-2015	Status:	VALID remind me the status change Email:
Language:	English	File Format:	PDF
Word Count:	4000 words	Price(USD):	120 (USD) remind me the price change Email:
Implemented on:	2015-10-01	Delivery:	via email in 1-3 business day
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Standard No.:	YS/T 1025-2015
Chinese Name:	电子薄膜用高纯钨及钨合金溅射靶材
English Name:	High-purity tungsten and tungsten alloy sputtering target used in electronic film
Professional Classification:	H63 Rare refractory metals and their compounds
Professional Classification:	YS Professional Standard - Non-ferrous Metal
ICS Classification:	77.150.99 Other products of non-ferrous metals
Issued by:
Issued on:	2015-04-30
Implemented on:	2015-10-01
Status:	VALID
Language:	English
File Format:	PDF
Word Count:	4000 words
Price(USD):	120 (USD)
Delivery:	via email in 1-3 business day

YS/T 1025-2015 The following standards are cited：

YS/T 1025-2015 Cited by the following standards：

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