High-purity sputtering copper target used in electronic film

YS/T 819-2012 High-purity sputtering copper target used in electronic film
Standard No.:	YS/T 819-2012	Status:	VALID remind me the status change Email:
Target Language:	English	File Format:	PDF
Word Count:	6000 words	Translation Price:	180 (USD) remind me the price change Email:
Implemented on:	2013-03-01	Delivery:	via email in 1-3 business day
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Standard No.:	YS/T 819-2012
Chinese Name:	电子薄膜用高纯铜溅射靶材
English Name:	High-purity sputtering copper target used in electronic film
Professional Classification:	H62 Heavy metals and their alloys
ICS Classification:	77.150.30 Copper products
Issued by:
Issued on:	2012-11-07
Implemented on:	2013-03-01
Status:	VALID
Target Language:	English
File Format:	PDF
Word Count:	6000 words
Translation Price:	180 (USD)
Delivery:	via email in 1-3 business day

YS/T 819-2012 The following standards are cited：

YS/T 819-2012 Cited by the following standards：