Test method of particles on silicon wafer surfaces

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GB/T 19921-2005 Test method of particles on silicon wafer surfaces
Standard No.:	GB/T 19921-2005	Status:	ABOLISHED remind me the status change Email:
Language:	English	File Format:	PDF
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Implemented on:	2006-04-01	Delivery:	via email in 1-3 business day
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Standard No.:	GB/T 19921-2005
Chinese Name:	硅抛光片表面颗粒测试方法
English Name:	Test method of particles on silicon wafer surfaces
Professional Classification:	H17 Semimetal and semiconductor material analysis method
Professional Classification:	GB National Standard
ICS Classification:	77.040.01 Testing of metals in general
Issued by:
Issued on:	2005-09-19
Implemented on:	2006-04-01
Status:	ABOLISHED
Replace By:	GB/T19921-2018 Test method for particles on polished silicon wafer surfaces
Replace By Date:	2019-07-01
Language:	English
File Format:	PDF
Word Count:
Price(USD):	please email coc@codeofchina.com for quotation
Delivery:	via email in 1-3 business day

GB/T 19921-2005 The following standards are cited：

GB/T 19921-2005 Cited by the following standards：

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