Test method for the content of metal impurity in electronic grade polysilicon—Inductively coupled-plasma mass spectrometry method

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GB/T 37049-2018 Test method for the content of metal impurity in electronic grade polysilicon—Inductively coupled-plasma mass spectrometry method
Standard No.:	GB/T 37049-2018	Status:	VALID remind me the status change Email:
Language:	English	File Format:	PDF
Word Count:	6000 words	Price(USD):	180 (USD) remind me the price change Email:
Implemented on:	2019-04-01	Delivery:	via email in 1-3 business day
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Standard No.:	GB/T 37049-2018
Chinese Name:	电子级多晶硅中基体金属杂质含量的测定电感耦合等离子体质谱法
English Name:	Test method for the content of metal impurity in electronic grade polysilicon—Inductively coupled-plasma mass spectrometry method
Professional Classification:	H17 Semimetal and semiconductor material analysis method
ICS Classification:	77.040.30 Chemical analysis of metals
Issued by:
Issued on:
Implemented on:	2019-04-01
Status:	VALID
Language:	English
File Format:	PDF
Word Count:	6000 words
Price(USD):	180 (USD)
Delivery:	via email in 1-3 business day

GB/T 37049-2018 The following standards are cited：

GB/T 37049-2018 Cited by the following standards：

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