Test method for measuring surface metal contamination on silicon wafers by total reflection X-ray fluorescence spectroscopy

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GB/T 24578-2009 Test method for measuring surface metal contamination on silicon wafers by total reflection X-ray fluorescence spectroscopy
Standard No.:	GB/T 24578-2009	Status:	ABOLISHED remind me the status change Email:
Language:	English	File Format:	PDF
Word Count:	8000 words	Price(USD):	240 (USD) remind me the price change Email:
Implemented on:	2010-06-01	Delivery:	via email in 1-3 business day
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Standard No.:	GB/T 24578-2009
Chinese Name:	硅片表面金属沾污的全反射X光荧光光谱测试方法
English Name:	Test method for measuring surface metal contamination on silicon wafers by total reflection X-ray fluorescence spectroscopy
Professional Classification:	H80 Semimetal and semiconductor material in general
Professional Classification:	GB National Standard
ICS Classification:	29.045 Semiconducting materials
Issued by:
Issued on:	2009-10-30
Implemented on:	2010-06-01
Status:	ABOLISHED
Replace By:	GB/T24578-2015 Test method for measuring surface metal contamination on silicon wafers by total reflection X-Ray fluorescence spectroscopy
Replace By Date:	2017-01-01
Language:	English
File Format:	PDF
Word Count:	8000 words
Price(USD):	240 (USD)
Delivery:	via email in 1-3 business day

GB/T 24578-2009 The following standards are cited：

GB/T 24578-2009 Cited by the following standards：

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